Name of the equipment:

RF Magnetron Sputtering System

Make & Model:

M/s VR Technologies & Custom-built system

I-Stem Registration ID-

3236920                        

Category of Instrument: Hardware

Types of Analysis / Testing:

Deposition of thin film

Application: Thin film coating

Description of Instrument:

·         Technique to deposit thin films on substrates

·         Co-sputtering of 3 targets with sputter down configuration

Book through I-STEM:

https://www.istem.gov.in/

Slot Booking Link

I-STEM Slot Booking link for External User

Booking available for

Internal and External Both

Requisition form for

Internals

Externals

Faculty In-charge:

Dr. Lintu Rajan

Email ID:

lintu@nitc.ac.in

Phone number:

04952286718

Technical Staff:

Vishnu PS (ST)

vishnups@nitc.ac.in

Afsal VC (TA)

afsalvc@nitc.ac.in

Department

ECED

Office Email ID

ecedoffice@nitc.ac.in

Location

Block-II, Room No: 208

Project Lab

Electronics and Communication Engineering Department

Lab Phone No

……………………………….

Features of the equipment

·         Technique to deposit thin films on substrates

·         Co-sputtering of 3 targets with sputter down configuration

·         Compatible with both DC & RF power source

Unique features/Measurement capabilities, if any

Instrument Technical Description and Major Specifications (This Specifications Limited to Major 5)

Measurement/Sample specifications:

·         5 samples (1cm x 1cm) or appropriate, in one process run.

·         Sputtering Targets: 2- and 3-inch Diameter

·         Substrate and target need to be made available by the user.

·        

Sputtering Targets: 2- and 3-inch Diameter